In this work we report the room temperature magnetoresistance (MR) for electrodeposited Ni-Cu/Cu multilayer thin film and multilayer nanowires. For the multilayer thin films the maximum giant magnetoresistance (GMR) of 1.5% was obtained around 2.5 nm magnetic layer thickness and 1.5 nm nonmagnetic layer thickness, while the maximum GMR of 3.6% was measured for the multilayer nanowire with 5 and 2.8 nm thickness for magnetic and nonmagnetic thickness respectively. The multilayer thin films were grown on (100)-textured n-type Si substrates while multilayer nanowires were fabricated into arrays of ion-etched polycarbonate membranes. The structure and magnetic properties of both multilayer thin films and nanowires then were investigated using scanning electron microscopy (SEM), alternating force magnetometry (AGFM), and electric resistivity measurements in the presence of an applied magnetic field.
